Influence of structure design parameters of chamber and buffer on thickness uniformity of iron oxide CVD thin film

Authors

• YK Yong-Hyon Kim¹
• YH Yong-Ju Han²
• HB Hak Bong Kim³

^{1 2 3} Student member, IEEE, Semiconductor Institute, Kim Chaek University of Technology, Yonggwang Street, Pyongyang, Democratic People’s Republic of Korea.