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Influence of structure design parameters of chamber and buffer on thickness uniformity of iron oxide CVD thin film
Authors
1 2 3 Student member, IEEE, Semiconductor Institute, Kim Chaek University of Technology, Yonggwang Street, Pyongyang, Democratic People’s Republic of Korea.
Article Information
- Published In
- Volume 5, Issue 5 (2025)
- Published Online
- September-October 2025
- Pages
- 122-129
- Article Type
- Original Article
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Citations
Yong-Hyon Kim1, Yong-Ju Han2, Hak Bong Kim3, “Influence of structure design parameters of chamber and buffer on thickness uniformity of iron oxide CVD thin film ”, International Journal of Recent Trends in Multidisciplinary Research, September-October 2025, Vol 5(05), 122-129.
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